Plasmas are well-known tools for our daily lives. We are now dreaming of generating green energy from fusion as soon as possible. Among the various areas of studies, considerable emphasis is being given to low-temperature plasmas and their societal applications using plasma-based devices operated at a very low pressure to atmospheric pressure. Over the past few decades, the cold atmospheric pressure plasmas have emerged as a potential candidate for different kinds of applications, e.g., energy, electronics, agriculture, biomedical, food preservation, textile, etc. For any practical application, we need to design a plasma process and utilize a recipe that is controlled by the plasma parameters and energy of the plasma species. For the study and optimization of the process, one needs to employ innovative and dedicated plasma diagnostics tools/techniques. Consequently, extensive basic studies have been conducted on their applications of low-temperature plasmas in different areas. Notably, the synthesis and etching of thin films by plasma processes have been widely applied in a variety of industrial sectors. The structure control of thin film is one of the prime factors in most of these applications. It is well known that the structure of this film is closely associated with plasma parameters and species of plasma, which are electrons, ions, radicals, and neutrals in plasma processes. However, the precise control of structure by plasma process is still limited due to inherent complexity, reproducibility, and control problems in the practical implementation of plasma processing. Therefore, the study of the fundamental physical properties that govern the plasmas becomes more crucial for molecular scale control of film structure and corresponding properties for new generation nanoscale film materials, their development, and applications. In this sense, integrated experimental studies, including diagnostics and computer modeling of process plasmas to quantify the effect of the unique chemistry and structure of the growing film by radical and plasma control, are realized. Apart from plasma-based deposition and etching, the workshop will include plasma in energy, environment, and plasma-based processes used for bio-healthcare, agriculture, and other applications.